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B + W 52mm T-Pro 010M UV Haze MRC Nano Filter 66-1097751

Photos - Lens Filter B + W 52mm T-Pro 010M UV Haze MRC Nano Filter 66-1097751
$68.00 
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Adorama.com

B + W 52mm T-Pro 010M UV Haze MRC Nano Filter 66-1097751

Adorama.com
Delivery: in USA
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B + W 52mm T-Pro 010M UV Haze MRC Nano Filter 66-1097751
$68.00 

Buy B + W 52mm T-Pro 010M UV Haze MRC Nano Filter 66-1097751

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B + W 52mm T-Pro 010M UV Haze MRC Nano Filter 66-1097751

Take your photography to new heights with the B+W 52mm T-Pro 010M UV Haze MRC Nano Filter. This color-neutral filter is expertly designed to block UV components of daylight, ensuring your ocean and high mountain region photos are free from blurring or a blueish cast caused by unwanted invisible UV light. The 010M filter is equipped with a MRC Nano... morecoating, a feature that actively repels water and dust. This makes it an invaluable tool for active photographers who expose their cameras and lenses to demanding environments. Whether you're dealing with blowing sand, dust, fingerprints, or splashing water, this B+W filter provides superior lens protection.Not only are B+W filters cost-effective compared to replacing a lens, but they're also easier to clean. They can remain affixed to the lens permanently due to their color-neutral and highly transparent properties. The B+W MRC nano-coating ensures an extremely low reflection, allowing the optical information to reach the image sensor (or film) unaffected.With these highly transparent B+W protection filters, there's no need for exposure compensation factor, making your photography process smoother. These filters play a crucial role in digital photography, especially considering the larger depth of field resulting from smaller image sensors. This can amplify the effects on image quality from front lens soiling. Fingerprints, for instance, can significantly reduce sharpness, particularly in zoom lenses with lower light intensity. Frequent cleaning of the front lens can not only cause scratching but also transport dirt particles or moisture at the edge of the mount to the inside of the lens system. With the B+W 52mm T-Pro 010M UV Haze MRC Nano Filter, you can mitigate these issues, ensuring your lens remains clean and your images sharp.
Adorama.com
Delivery: in USA
Report
$67.80
Take your photography to new heights with the B+W 52mm T-Pro 010M UV Haze MRC Nano Filter. This color-neutral filter is expertly designed to block UV components of daylight, ensuring your ocean and high mountain region photos are free from blurring or a blueish cast caused by unwanted invisible UV light. The 010M filter is equipped with a MRC Nano coating, a feature that actively repels water and dust. This makes it an invaluable tool for active photographers who expose their cameras and lenses to demanding environments. Whether you're dealing with blowing sand, dust, fingerprints, or splashing water, this B+W filter provides superior lens protection.Not only are B+W filters cost-effective compared to replacing a lens, but they're also easier to clean. They can remain affixed to the lens permanently due to their color-neutral and highly transparent properties. The B+W MRC nano-coating ensures an extremely low reflection, allowing the optical information to reach the image sensor (or film) unaffected.With these highly transparent B+W protection filters, there's no need for exposure compensation factor, making your photography process smoother. These filters play a crucial role in digital photography, especially considering the larger depth of field resulting from smaller image sensors. This can amplify the effects on image quality from front lens soiling. Fingerprints, for instance, can significantly reduce sharpness, particularly in zoom lenses with lower light intensity. Frequent cleaning of the front lens can not only cause scratching but also transport dirt particles or moisture at the edge of the mount to the inside of the lens system. With the B+W 52mm T-Pro 010M UV Haze MRC Nano Filter, you can mitigate these issues, ensuring your lens remains clean and your images sharp.
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